Patent Examiner Woo Kyung Lee
Art Unit 2815 · Semiconductor Transistors, Memory, LEDs & Packaging · Tech Center 2800 · 271 applications filed 2021–2026
Woo Kyung Lee is a USPTO patent examiner in Art Unit 2815 (Semiconductor Transistors, Memory, LEDs & Packaging) with 271 applications from filing years 2021–2026. Examiner Lee's allowance rate is 86.2%, above the 82.4% USPTO average for applications filed in the same years. The examiner ranks easier than 55% of examiners. In 2021, decided applications with an examiner interview were allowed 41.3 percentage points more often than those without.
Data through October 2026 from USPTO Patent Center (formerly PAIR) · Methodology
Overview
FreeExaminer details
- Art unit2815 · Semiconductor Transistors, Memory, LEDs & Packaging
- Title / gradePatent Examiner · GS-12
- Service4 years
- PhoneOn each office action
- In USPTO recordsLEE, WOO KYUNG
Office actions from Examiner Lee are reviewed and signed by a more senior examiner before issuing, so clear written arguments carry extra weight.
How to improve your odds with Examiner Lee
- The data favors an interview. Interviewed cases were allowed more often in all 3 measured years, by 6.9 to 41.3 points.
- Plan for the timeline. First office action averages 836 days vs the 632-day USPTO norm.
- Expect a §103. Obviousness is the most-issued rejection (249), and applicants overcame it 63.8% of the time.
- The data favors an RCE here. Cases with an RCE were allowed more often in all 3 measured years, by 5.6 to 39.3 points.
Historical patterns from this examiner's past cases, shown for general information. This is not legal advice and does not predict the outcome of any specific application. Decisions about interviews, RCEs, and claim strategy should be made with a licensed patent attorney or agent.
Rejection patterns & how they get overcome
FreeOf the 60 winning responses to Examiner Lee's §103 rejections that Boundly has classified, 55 (92%) amended the claims and argued, 3 argued without amending, and 2 amended without arguing. Each winning response, with its arguments and claim amendments, is in the file wrapper.
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Draft your response with Examiner Lee's record and Art Unit 2815's history in view, including the rejection patterns, the interview record, and the arguments that have overcome them. See office action responses in AI Studio.
Trends
| Year | Interview rate | Allowance w/ interview | Allowance w/o | Delta |
|---|---|---|---|---|
| 2023 | 29.2% | 100.0% | 93.1% | +6.9pp |
| 2022 | 40.3% | 96.2% | 78.8% | +17.4pp |
| 2021 | 67.1% | 93.5% | 52.2% | +41.3pp |
RCE behavior
Allowance after a Request for Continued Examination versus without one, per year. Use it to judge whether an RCE is worth the cost in front of Examiner Lee.
| Year | RCE rate | Allowance w/ RCE | Allowance w/o | Delta |
|---|---|---|---|---|
| 2023 | 20.0% | 100.0% | 94.4% | +5.6pp |
| 2022 | 51.4% | 100.0% | 75.0% | +25.0pp |
| 2021 | 70.0% | 91.7% | 52.4% | +39.3pp |
Recent outcomes
Free🔒 Case detail for members| App # | Title | Outcome | OAs | Arguments & redline |
|---|---|---|---|---|
| 18/240041 | Non-Volatile Memory Device | Patented | 1 | 🔒 View |
| 18/217701 | Semiconductor Package and Method for Fabricating the Same | Patented | 1 | 🔒 View |
| 18/424791 | Gate Sidewall Structures of Semiconductor Devices and Methods of Forming the Same | Patented | 0 | 🔒 View |
| 18/419385 | Fabrication Method for a Three-Dimensional Memory Array of Thin-Film Ferroelectric Transistors Using High-Aspect-Ratio Local Word Line Damascene Process | Patented | 0 | 🔒 View |
Art Unit 2815 technology
Frequently asked questions
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